Preparation method for carbon-based thin-film attenuation filter

一种碳基薄膜衰减滤光片的制备方法

Abstract

The invention discloses a preparation method for a carbon-based thin-film attenuation filter, relating to a filter. The invention provides a preparation method for a carbon-based thin-film attenuation filter which is simple in technology, easy in the design of a film system, and good in stability. The preparation method comprises the steps of cleaning a substrate; by taking graphite as a target material, performing vacuum film plating on the substrate through using a plasma beam sputtering method to obtain the carbon-based thin-film attenuation filter. The prepared carbon-based thin-film attenuation filter is simple in film system, good in stability and simple in preparation technology. The adhesive force of a carbon-based thin film and the substrate is high. The carbon film has smooth attenuation within visible wavelength range, and lower reflectivity is guaranteed so as to inhibit stray light; the carbon film has higher attenuation within in near ultraviolet, and can partially replace functions of a UV mirror to protect an inductive element. The thickness of the carbon-based thin film can be realized through controlling the function of a radio-frequency coil, the bias voltage of the target material, and the sputtering deposition time.
一种碳基薄膜衰减滤光片的制备方法,涉及一种滤光片。提供一种工艺简单、膜系设计简单、稳定性好的一种碳基薄膜衰减滤光片的制备方法。将基底清洗;以石墨为靶材,使用等离子束溅射法,在基底上进行真空镀膜,得碳基薄膜衰减滤光片。所制备的碳基薄膜滤光片的膜系简单,稳定性好,且制备工艺简单。碳基薄膜与基底的附着力高。在可见光波长范围内碳膜具有比较平滑的衰减,同时保证较低的反射率以抑制杂散光;在近紫外,碳膜具有较高的衰减,可以部分替代UV镜的功能保护感光元件。碳基薄膜的厚度可以通过控制射频线圈功率、靶材偏压、溅射沉积时间来实现。

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